The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2025

Filed:

Sep. 21, 2022
Applicant:

Robert Bosch Gmbh, Stuttgart, DE;

Inventors:

Shuhua Yu, Pittsburgh, PA (US);

Aniruddha Saha, Elkridge, MD (US);

Chaithanya Kumar Mummadi, Pittsburgh, PA (US);

Wan-Yi Lin, Wexford, PA (US);

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06V 20/00 (2022.01); G06V 10/22 (2022.01); G06V 10/26 (2022.01); G06V 10/764 (2022.01); G06V 20/52 (2022.01);
U.S. Cl.
CPC ...
G06V 20/95 (2022.01); G06V 10/22 (2022.01); G06V 10/267 (2022.01); G06V 10/764 (2022.01); G06V 20/52 (2022.01);
Abstract

A computer-implemented system and method relate to certified defense against adversarial patch attacks. A set of one-mask images is generated using a first mask at a set of predetermined regions of a source image. The source image is obtained from a sensor. A set of one-mask predictions is generated, via a machine learning system, based on the set of one-mask images. A first one-mask image is extracted from the set of one-mask images. The first one-mask image is associated with a first one-mask prediction that is identified as a minority amongst the set of one-mask predictions. A set of two-mask images is generated by masking the first one-mask image using a set of second masks. The set of second masks include at least a first submask and a second submask in which a dimension of the first submask is less than a dimension of the first mask. A set of two-mask predictions is generated based on the set of two-mask images. Class data, which classifies the source image, is selected based on the set of two-mask predictions.


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