The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2025
Filed:
Jun. 27, 2022
The Trustees of Princeton University, Princeton, NJ (US);
Seung-Hwan Baek, Princeton, NJ (US);
Felix Heide, Princeton, NJ (US);
The Trustees of Princeton University, Princeton, NJ (US);
Abstract
The present disclosure relates generally to image processing, and more particularly, toward techniques for structured illumination and reconstruction of three-dimensional (3D) images. Disclosed herein is a method to jointly learn structured illumination and reconstruction, parameterized by a diffractive optical element and a neural network in an end-to-end fashion. The disclosed approach has a differentiable image formation model for active stereo, relying on both wave and geometric optics, and a trinocular reconstruction network. The jointly optimized pattern, dubbed 'Polka Lines,' together with the reconstruction network, makes accurate active-stereo depth estimates across imaging conditions. The disclosed method is validated in simulation and used with an experimental prototype, and several variants of the Polka Lines patterns specialized to the illumination conditions are demonstrated.