The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2025
Filed:
Feb. 12, 2024
Agc Inc., Tokyo, JP;
AGC INC., Tokyo, JP;
Abstract
A reflective mask blank for EUV lithography, includes: a substrate; a conductive film; a reflective layer; and an absorption layer, the absorption layer absorbing the EUV light, wherein the conductive film has a refractive index nof 5.300 or less and has an extinction coefficient kof 5.200 or less, at a wavelength of 1000 nm to 1100 nm, the conductive film has a refractive index nof 4.300 or less and has an extinction coefficient kof 4.500 or less, at a wavelength of 600 nm to 700 nm, the conductive film has a refractive index nof 2.500 or more and has an extinction coefficient kof 0.440 or more, at a wavelength of 400 nm to 500 nm, and the conductive film has a film thickness t of 40 nm to 350 nm.