The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2025

Filed:

Jan. 27, 2022
Applicant:

Hoya Lens Thailand Ltd., Pathumthani, TH;

Inventor:

Shohei Matsuoka, Tokyo, JP;

Assignee:

HOYA LENS THAILAND LTD., Pathumthani, TH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02C 7/02 (2006.01); G02C 7/06 (2006.01);
U.S. Cl.
CPC ...
G02C 7/027 (2013.01); G02C 7/028 (2013.01); G02C 7/06 (2013.01);
Abstract

A technology that makes a change in the amount of aberration in a spectacle lens worn by wearer relative to a change in at least one of the aberration in the eye or spectacle lens. A method for designing a spectacle lens wherein, when a degree of change caused by a physical feature of wearer in at least one of an aberration distribution of an eye of wearer and an aberration distribution of a spectacle lens worn by the wearer is large, a spectacle lens that has an aberration distribution of which rotational asymmetry is weak in a region having a predetermined width and a center at any point on a main meridian of the spectacle lens is obtained as a design solution, and when the degree of the change is small, a spectacle lens of which rotational asymmetry is strong in the region is obtained as a design solution.


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