The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2025
Filed:
Apr. 23, 2021
Enmet, Llc, Bowling Green, KY (US);
Henry Wohltjen, Bowling Green, KY (US);
Enmet, LLC, Bowling Green, KY (US);
Abstract
A system and method for ascertaining the concentration of a preselected target substance, characterized by a mitigated tendency for yielding results distorted by a departure from a state of calibration, i.e., by 'drift', which drift is ordinarily caused by temperature and humidity variations; drift-mitigation is achieved by exposure of a target substance to a metal oxide semiconductor material, the temperature of a heating element operatively associated with said material being cycled between a low-temperature interval and a high-temperature interval, in which latter interval the material's temperature is raised to a level at or above the minimum temperature for rapid formation of one or more oxides of the target substance, the oxide formation taking place in a sufficiently short time that the conductivity is reflective of a transient signal amplitude in a brief interval of time, such that the external factors causing drift do not have sufficient opportunity to distort the concentration determination.