The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2025
Filed:
May. 27, 2020
Chengdu Boe Optoelectronics Technology Co., Ltd., Sichuan, CN;
Boe Technology Group Co., Ltd., Beijing, CN;
Chengdu BOE Optoelectronics Technology Co., Ltd., Sichuan, CN;
BOE Technology Group Co., Ltd., Beijing, CN;
Abstract
The present disclosure relates to a mask, a mask device and a mask design method. The mask includes: a pattern area, wherein the pattern area includes a plurality of openings, among which adjacent openings are spaced apart by a first rib, and at least one of the plurality of openings has a non-straight side, two first straight sides intersecting with the non-straight side, and a second straight side opposite to the non-straight side and intersecting with the first straight sides; and a second rib located at an edge of the pattern area, wherein the second rib is provided with a cutout for compensating for stretch deformation of the non-straight side, extending lines of the two first straight sides extending toward the second rib along a first direction intersect with the second rib to obtain a first area, and the cutout is located at least within the first area.