The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2025

Filed:

May. 28, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kim Ramkumar Vellore, San Jose, CA (US);

Leonid M. Tertitski, Vista, CA (US);

Matthew D. Scotney-Castle, Morgan Hill, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G01J 5/00 (2022.01); G01J 5/48 (2022.01); H04N 5/33 (2023.01);
U.S. Cl.
CPC ...
H01L 21/67248 (2013.01); G01J 5/00 (2013.01); H04N 5/33 (2013.01); G01J 2005/0077 (2013.01); G01J 5/485 (2022.01);
Abstract

A method and apparatus for measuring a temperature of a substrate located in a semiconductor processing environment is disclosed. The substrate has a top surface and an edge surface, and is positioned in a prescribed location within the semiconductor processing environment. An infrared camera oriented to view one side of the edge surface of the substrate is triggered to obtain an infrared image of the one side of the edge surface of the substrate. The infrared image is processed to obtain a temperature profile of the substrate.


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