The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2025
Filed:
Dec. 24, 2019
Hitachi High-tech Corporation, Tokyo, JP;
Shota Aida, Tokyo, JP;
Hisayuki Takasu, Tokyo, JP;
Atsushi Kamino, Tokyo, JP;
Hitoshi Kamoshida, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
There is provided an ion milling apparatus that can enhance reproducibility of ion distribution. The ion milling apparatus includes an ion source, a sample stageon which a sample processed by radiating a non-convergent ion beam from the ion sourceis placed, a drive unitthat moves a measurement member holding sectionholding an ion beam current measurement memberalong a track located between the ion source and the sample stage, and an electrodethat is disposed near the track, in which a predetermined positive voltage is applied to the electrode, the ion beam current measurement memberis moved within a radiation range of the ion beam by the drive unit, in a state in which the ion beam is output from the ion sourceunder a first radiation condition, and an ion beam current that flows when the ion beam is radiated to the ion beam current measurement memberis measured.