The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2025

Filed:

Jan. 09, 2023
Applicants:

Chengdu Boe Optoelectronics Technology Co., Ltd., Sichuan, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Chang Luo, Beijing, CN;

Xiping Li, Beijing, CN;

Hongwei Ma, Beijing, CN;

Ming Hu, Beijing, CN;

Wei He, Beijing, CN;

Youngyik Ko, Beijing, CN;

Haijun Qiu, Beijing, CN;

Yi Zhang, Beijing, CN;

Taofeng Xie, Beijing, CN;

Tianci Chen, Beijing, CN;

Qun Ma, Beijing, CN;

Xinghua Li, Beijing, CN;

Ping Wen, Beijing, CN;

Yang Zhou, Beijing, CN;

Yuanqi Zhang, Beijing, CN;

Xiaoyan Yang, Beijing, CN;

Shun Zhang, Beijing, CN;

Pandeng Tang, Beijing, CN;

Yang Zeng, Beijing, CN;

Tong Zhang, Beijing, CN;

Xiaofei Hou, Beijing, CN;

Zhidong Wang, Beijing, CN;

Haoyuan Fan, Beijing, CN;

Jinhwan Hwang, Beijing, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/041 (2006.01); G06F 3/044 (2006.01);
U.S. Cl.
CPC ...
G06F 3/0412 (2013.01); G06F 3/04164 (2019.05); G06F 3/0445 (2019.05); G06F 3/0446 (2019.05);
Abstract

A display panel, including an active area and a peripheral area, which is located outside of the active area, wherein the active area comprises a base substrate, and a display structure layer and a touch structure layer sequentially arranged on the base substrate; the peripheral area includes an isolation dam, a first ground trace and a second ground trace arranged on the base substrate; and the first ground trace is located at a side of the isolation dam close to the active area, and the second ground trace is located at a side of the isolation dam away from the active area.


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