The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2025
Filed:
Dec. 06, 2021
Canon Kabushiki Kaisha, Tokyo, JP;
Kenji Yoshida, Tochigi, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint apparatus capable of stably maintaining the concentration of gas supplied for imprint processing is provided even after the moving direction of a substrate is changed by comprising a gas supply port, and when the moving direction or the substrate is changed so that a next target shot region is to be imprinted, the substrate is moved to a position in the order of the next target shot region, the gas supply port, and the pattern region of a mold from the upstream in a predetermined direction, the substrate is then moved in the predetermined direction so that the next target shot region and the pattern region face each other while supplying the gas from the gas supply port, and then the next target shot region is imprinted by the pattern region.