The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2025
Filed:
Aug. 29, 2024
Agc Inc., Tokyo, JP;
Takeshi Okato, Tokyo, JP;
AGC INC., Tokyo, JP;
Abstract
A reflective mask blank, which is a binary reflective mask blank, includes, in order: a substrate; a multilayer reflective film configured to reflect EUV light; and a pattern film. The pattern film has a laminated structure including a total of L layers each having a different refractive index where L is a natural number of 2 or more. When an absorption coefficient of an i-th layer in the pattern film from a side opposite to the substrate is defined as k, a thickness of the i-th layer in the pattern film from the side opposite to the substrate is defined as d(nm), a total thickness of the pattern film is defined as d, an exposure wavelength is defined as λ (nm), and Pis defined as 1−exp(−2π/λ*dk), the following formula (1) is satisfied.