The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2025

Filed:

Sep. 22, 2022
Applicant:

Betone Technology Shanghai, Inc., Shanghai, CN;

Inventors:

Weicong Song, Shanghai, CN;

Wenjun Xie, Shanghai, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 14/50 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4584 (2013.01); C23C 14/505 (2013.01); C23C 16/4586 (2013.01);
Abstract

A vapor deposition device capable of reciprocating rotation and lifting is disclosed. The vapor deposition device includes a vapor deposition cavity, a base station, a base shaft, a telescopic assembly, a passive lifting rotation member, a rotation mechanism, and a lifting mechanism. The rotation mechanism is fixedly connected with the telescopic assembly, and configured to drive the telescopic assembly to perform a reciprocating rotational motion, which in turn drives the base station, the base shaft, and the passive lifting rotation member to perform a reciprocating rotational motion in sequence. The lifting mechanism is rotatably and slidably connected with the passive lifting rotation member, and configured to drive the passive lifting rotation member to move up and down, which in turn drives the base shaft and the base station to move up and down. The telescopic assembly extends when the base station ascends and shortens when the base station descends.


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