The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2025

Filed:

May. 07, 2021
Applicant:

Raytheon Technologies Corporation, Farmington, CT (US);

Inventors:

James T. Beals, West Hartford, CT (US);

Richard Wesley Jackson, Mystic, CT (US);

Xia Tang, West Hartford, CT (US);

Assignee:

RTX CORPORATION, Farmington, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 41/45 (2006.01); C04B 41/00 (2006.01); C04B 41/50 (2006.01); C04B 41/52 (2006.01);
U.S. Cl.
CPC ...
C04B 41/4539 (2013.01); C04B 41/0072 (2013.01); C04B 41/455 (2013.01); C04B 41/5071 (2013.01); C04B 41/52 (2013.01); C04B 2235/3891 (2013.01); C04B 2235/428 (2013.01); C04B 2235/5292 (2013.01);
Abstract

A method of applying a coating to a substrate includes forming a slurry by mixing elemental precursors of gettering particles, diffusive particles, matrix material, and a carrier fluid; applying the slurry to a substrate; and sintering the slurry to form a composite material. The sintering causes the elemental precursors to react with one another to form gettering particles. An article is also disclosed.


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