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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12226959 B1

PDFFull Text
Date of Patent:
Feb. 18, 2025

Filed:

Jul. 21, 2021

System and method for fabricating a custom face mask

Applicant:

Desprez, Llc, New London, NH (US);

Inventors:

Jonathan Schwartz, New York City, NY (US);

Oliver Ortlieb, New York City, NY (US);

Max Friefeld, New York City, NY (US);

Charlie Fenwick, New York City, NY (US);

Assignee:

Desprez LLC, New London, NH (US);

Attorney:

Caldwell Intellectual Property Law

Primary Examiner:

Jamil Ahmed

Int. Cl.
CPC ...
B29C 64/393 (2017.01); A41D 13/11 (2006.01); A62B 18/02 (2006.01); B29C 51/18 (2006.01); B33Y 50/02 (2015.01); G05B 19/414 (2006.01); G06F 30/27 (2020.01); G06T 17/20 (2006.01); B29L 31/48 (2006.01); B33Y 80/00 (2015.01); G06F 113/10 (2020.01);
U.S. Cl.
CPC ...
B29C 64/393 (2017.08); A41D 13/1107 (2013.01); A62B 18/02 (2013.01); B29C 51/18 (2013.01); B33Y 50/02 (2014.12); G05B 19/4145 (2013.01); G06F 30/27 (2020.01); G06T 17/20 (2013.01); B29L 2031/4835 (2013.01); B33Y 80/00 (2014.12); G06F 2113/10 (2020.01); G06T 2200/04 (2013.01);
Abstract

A system and method for fabricating a custom face mask. The system includes a factory client, wherein the factory client includes a computing device configured to receive, at a factory server and at least a user device, an image datum comprising a plurality of data of a face of a user. The computing device is further configured to map, as a function of a first machine-learning model, at least a facial landmark to a three-dimensional (3D) mesh of the image datum, map, as a function of a second machine-learning mode, a path to the 3D mesh including a boundary of a custom face mask configured for use on a user's face, generate a model file of a mold, instruct a manufacturing tool, and instruct a manufacturing device to thermoform the plastic component of the mold.

Find Patent Forward Citations

Schwartz, Jonathan. (2025). System and method for fabricating a custom face mask (U.S. Patent No. 12226959). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12226959

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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