The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2025

Filed:

Nov. 17, 2020
Applicant:

Apple Inc., Cupertino, CA (US);

Inventors:

Seunghee Han, San Jose, CA (US);

Shafi Bashar, Santa Clara, CA (US);

Yuan Zhu, Beijing, CN;

Yang Tang, Pleasanton, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04W 64/00 (2009.01); G01S 1/20 (2006.01); G01S 3/48 (2006.01); G01S 5/00 (2006.01); G01S 5/02 (2010.01); G01S 5/10 (2006.01); G01S 5/12 (2006.01); H04J 11/00 (2006.01); H04W 56/00 (2009.01);
U.S. Cl.
CPC ...
H04W 64/00 (2013.01); G01S 1/20 (2013.01); G01S 3/48 (2013.01); G01S 5/0036 (2013.01); G01S 5/0236 (2013.01); G01S 5/10 (2013.01); G01S 5/12 (2013.01); H04J 11/00 (2013.01); H04W 56/001 (2013.01);
Abstract

User equipment (UE), an enhanced NodeB (eNB) and method of improving positioning accuracy and enabling vertical domain positioning of the UE are generally described. The UE may receive a prsInfo control signal having at least one PRS configuration and subsequently a plurality of Reference Signals (RSs). The RSs may have a first Positioning Reference Signal (PRS) pattern in a first set of PRS subframes and a second PRS pattern in a second set of PRS subframes received prior to a subsequent first set of PRS subframes. The RSs may have a vertical positioning RS and a lateral positioning RS. The UE may measure PRS resource elements (REs), each having a PRS, in the first and second PRS pattern. The UE may transmit a measurement of the PRS in the first and second PRS pattern. The patterns may enable horizontal and vertical positioning to be determined.


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