The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2025
Filed:
Dec. 24, 2019
Hitachi High-tech Corporation, Tokyo, JP;
Shota Aida, Tokyo, JP;
Hisayuki Takasu, Tokyo, JP;
Atsushi Kamino, Tokyo, JP;
Hitoshi Kamoshida, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
Provided is an ion milling apparatus capable of enhancing reproducibility of an ion distribution. The ion milling apparatus includes: an ion source; a sample stageon which a sample to be processed by being irradiated with an unfocused ion beam from the ion sourceis placed; and a measurement member holding unitthat holds an ion beam current measurement member. A covering materialis provided so as to cover at least a surface of the measurement member holding unitand the sample stagefacing the ion source. A material of the covering materialcontains, as a main component, an element having an atomic number smaller than that of an element of a material of a structure on which the covering material is provided. The ion beam current measurement memberis moved in an irradiation range of the ion beam on a trajectory, which is located between the ion source and the sample stage, in a state where the ion beam is output from the ion sourceunder a first irradiation condition, and an ion beam current flowing when the ion beam current measurement memberis irradiated with the ion beam is measured.