The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2025
Filed:
Dec. 22, 2021
Wuxi Unicomp Technology Co., Ltd., Wuxi, CN;
Xiaojun Qiu, Wuxi, CN;
Wenwen Kong, Wuxi, CN;
Wei Zhang, Wuxi, CN;
Liucheng Wang, Wuxi, CN;
Qi Hou, Wuxi, CN;
Wuxi Unicomp Technology Co., Ltd., Wuxi, CN;
Abstract
An open microfocus X-ray source and a control method thereof are provided. The open microfocus X-ray source includes: an open X-ray tube, a high voltage power supply (HVPS) system, a vacuum system and a control system. The open X-ray tube includes a cathode system, a deflection system and a focusing system. The HVPS system is configured to provide an emission current I, an accelerating high voltage Uand a grid voltage Ufor an electron beam. The vacuum system is configured to perform vacuumization. The control system is configured to control, according to a spot size of an electron beam for bombarding an anode target, the HVPS system to adjust the emission current I, the accelerating high voltage U, a deflection coil current Iof the deflection system, and a focusing coil current Iof the focusing system, such that the spot size meets a preset requirement.