The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2025

Filed:

Nov. 16, 2021
Applicant:

Qorvo Us, Inc., Greensboro, NC (US);

Inventors:

George Maxim, Saratoga, CA (US);

Dirk Robert Walter Leipold, San Jose, CA (US);

Baker Scott, San Jose, CA (US);

Assignee:

Qorvo US, Inc., Greensboro, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 27/28 (2006.01); H01F 17/00 (2006.01); H03F 1/56 (2006.01); H03F 3/193 (2006.01); H03F 3/24 (2006.01); H03F 3/68 (2006.01); H03F 3/72 (2006.01); H04B 1/525 (2015.01); H03H 7/01 (2006.01); H03H 7/09 (2006.01);
U.S. Cl.
CPC ...
H01F 17/0013 (2013.01); H03F 1/565 (2013.01); H03F 3/193 (2013.01); H03F 3/245 (2013.01); H03F 3/68 (2013.01); H03F 3/72 (2013.01); H04B 1/525 (2013.01); H03F 2200/111 (2013.01); H03F 2200/267 (2013.01); H03F 2200/391 (2013.01); H03F 2200/451 (2013.01); H03F 2203/7209 (2013.01); H03H 7/09 (2013.01); H03H 7/1775 (2013.01); H03H 2210/012 (2013.01); H03H 2210/025 (2013.01); H03H 2210/04 (2013.01);
Abstract

Embodiments of an apparatus that includes a substrate and an inductor residing in the substrate are disclosed. In one embodiment, the inductor is formed as a conductive path that extends from a first terminal to a second terminal. The conductive path has a shape corresponding to a two-dimensional (2D) lobe laid over a three-dimensional (3D) volume. Since the shape of the conductive path corresponds to the 2D lobe laid over a 3D volume, the magnetic field generated by the inductor has magnetic field lines that are predominately destructive outside the inductor and magnetic field lines that are predominately constructive inside the inductor. In this manner, the inductor can maintain a high quality (Q) factor while being placed close to other components.


Find Patent Forward Citations

Loading…