The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2025
Filed:
Jul. 08, 2021
Applicant:
Hitachi High-tech Corporation, Tokyo, JP;
Inventors:
Takashi Dobashi, Hillsboro, OR (US);
Hiroyuki Kobayashi, Hillsboro, OR (US);
Takeshi Ohmori, Tokyo, JP;
Assignee:
Hitachi High-Tech Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 13/04 (2006.01); G06N 20/00 (2019.01); G06T 7/00 (2017.01); H01L 21/3065 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G05B 13/042 (2013.01); G06N 20/00 (2019.01); G06T 7/0006 (2013.01); H01L 21/3065 (2013.01); H01L 21/67253 (2013.01); H01L 22/20 (2013.01); G05B 2219/45031 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract
To facilitate evaluation of a predicted process shape in process recipe development using machine learning, a process recipe search apparatus that searches for an etching recipe that is a parameter of a plasma processing apparatus set so as to etch a sample into a desired shape displays, on a display device, the predicted process shape of the sample by a candidate etching recipe predicted by using a machine leaning model, by highlighting a difference between the predicted process shape and a target shape.