The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2025

Filed:

Mar. 29, 2021
Applicant:

SK Hynix Inc., Icheon-si, KR;

Inventor:

Ki Hong Lee, Icheon-si, KR;

Assignee:

SK hynix Inc., Icheon-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 41/27 (2023.01); H10B 41/10 (2023.01); H10B 43/10 (2023.01); H10B 43/27 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); H10B 41/10 (2023.02); H10B 41/27 (2023.02); H10B 43/10 (2023.02);
Abstract

Provided herein may be a method of manufacturing a semiconductor device. The method may include forming a stacked structure including alternately stacked first material layers and second material layers; forming a first opening including a through hole passing through the stacked structure and a notch coupled to the through hole and located in at least one of the interfaces of the first material layers and second material layers; forming a sacrificial layer including a first part located in the through hole and a second part located in the notch; and oxidizing the first part of the sacrificial layer and thereby forming a first sacrificial pattern located in the through hole and a plugging pattern located in the notch.


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