The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2025

Filed:

May. 18, 2022
Applicant:

Skyworks Solutions, Inc., Irvine, CA (US);

Inventors:

Guofeng Chen, Fremont, CA (US);

Michael Jon Wurtz, Lake Oswego, OR (US);

Rakesh Kumar, Singapore, SG;

You Qian, Singapore, SG;

Humberto Campanella-Pineda, Singapore, SG;

Assignee:

Skyworks Solutions, Inc., Irvine, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04R 31/00 (2006.01); B81B 3/00 (2006.01); H04R 3/00 (2006.01); H04R 17/02 (2006.01); H10N 30/05 (2023.01); H10N 30/30 (2023.01); H10N 30/50 (2023.01); H10N 30/87 (2023.01);
U.S. Cl.
CPC ...
H04R 31/006 (2013.01); B81B 3/0021 (2013.01); H04R 3/00 (2013.01); H04R 17/02 (2013.01); H10N 30/05 (2023.02); H10N 30/302 (2023.02); H10N 30/306 (2023.02); H10N 30/50 (2023.02); H10N 30/872 (2023.02); B81B 2201/0257 (2013.01); H04R 2201/003 (2013.01);
Abstract

A method of making an acoustic sensor (e.g., a piezoelectric sensor for a piezoelectric microelectromechanical systems microphone) includes forming or depositing one or more piezoelectric layers to define a beam extending between a proximal portion and a distal tip (e.g., unsupported free end), the beam having a width in plan view that is greater at a location distal of the proximal portion than at the proximal portion. The method also comprises attaching the beam to a substrate in cantilever form so that the proximal portion of the beam is anchored to the substrate and the distal tip is a free unsupported end of the beam. One or more electrodes are disposed on or in the proximal portion of the beam.


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