The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2025
Filed:
May. 10, 2022
Honor Device Co., Ltd., Shenzhen, CN;
Hepu Cao, Shenzhen, CN;
Jingwei Li, Shenzhen, CN;
Honor Device Co., Ltd., Shenzhen, CN;
Abstract
This application provides an exposure parameter adjustment method, device, and storage medium. The method includes: obtaining a face box of a first-frame image and a second-frame image, where the face box of the first-frame image is used to indicate a region of a face in the first-frame image, and the second-frame image is a next-frame image of the first-frame image; correcting the face box of the first-frame image to obtain a second-face box; cropping the second-frame image based on the second-face box to obtain a face image of the second-frame image; and adjusting an exposure parameter based on the face image of the second-frame image. In this solution, a face box of a previous-frame image is first corrected, then a face image is cropped by using the second-face box, so that a face image obtained through cropping and an actual face region in an image that is cropped are consistent.