The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2025

Filed:

Jul. 05, 2022
Applicant:

C3.ai, Inc., Redwood City, CA (US);

Inventors:

Kuenley Chiu, San Francisco, CA (US);

Jeremy Kolter, Pittsburgh, CA (US);

Nikhil Krishnan, Los Altos, CA (US);

Henrik Ohlsson, San Francisco, CA (US);

Assignee:

C3.ai, Inc., Redwood City, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04L 9/40 (2022.01); G06Q 10/0635 (2023.01); G06Q 50/06 (2024.01);
U.S. Cl.
CPC ...
H04L 63/1433 (2013.01); G06Q 10/0635 (2013.01); H04L 63/1425 (2013.01); H04L 63/20 (2013.01); G06Q 50/06 (2013.01); H04L 63/101 (2013.01);
Abstract

The disclosed technology can acquire a first set of data from a first group of data sources including a plurality of network components within an energy delivery network. A first metric indicating a likelihood that a particular network component, from the plurality of network components, is affected by cyber vulnerabilities can be generated based on the first set of data. A second set of data can be acquired from a second group of data sources including a collection of services associated with the energy delivery network. A second metric indicating a calculated impact on at least a portion of the energy delivery network when the cyber vulnerabilities affect the particular network component can be generated based on the second set of data. A third metric indicating an overall level of cybersecurity risk associated with the particular network component can be generated based on the first metric and the second metric.


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