The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2025

Filed:

Feb. 23, 2024
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kirankumar Neelasandra Savandaiah, Bangalore, IN;

Nitin Bharadwaj Satyavolu, Kakinada, IN;

Srinivasa Rao Yedla, Bangalore, IN;

Bhaskar Prasad, Jamshedpur, IN;

Thomas Brezoczky, Los Gatos, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67126 (2013.01); C23C 14/35 (2013.01); C23C 14/50 (2013.01); H01J 37/32513 (2013.01); H01J 37/32715 (2013.01); H01J 37/3405 (2013.01); H01J 37/3426 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/332 (2013.01); H01L 21/67167 (2013.01); H01L 21/67207 (2013.01);
Abstract

A method and apparatus for substrate processing and a cluster tool including a transfer chamber assembly and a plurality of processing assemblies. Processing chamber volumes are sealed from the transfer chamber volume using a support chuck on which a substrate is disposed. A seal ring assembly is coupled to the support chuck. The seal ring assembly includes an inner assembly, an assembly bellows circumscribing the inner assembly, and a bellows disposed between the inner and outer platform. An inner ring is disposed between inner assembly of the seal ring assembly and the bottom surface of the support chuck. An outer ring disposed between the seal ring assembly and the lower sealing surface of the process chamber wall. The support chuck is raised to form an isolation seal between the processing chamber volume and the transfer chamber volume using the bellows, the inner ring, and the outer ring.


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