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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12216402 B1

PDFFull Text
Date of Patent:
Feb. 04, 2025

Filed:

Nov. 07, 2023

Photoacid generator

Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Gerhard Ingmar Meijer, Zurich, CH;

Valery Weber, Gattikon, CH;

Peter Willem Jan Staar, Zurich, CH;

Assignee:

International Business Machines Corporation, Armonk, NY (US);

Attorney:

Randy Tejeda

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 309/06 (2006.01); C07C 309/19 (2006.01); C07C 309/30 (2006.01); C07C 309/39 (2006.01); C07C 311/48 (2006.01); C07C 381/12 (2006.01); C07D 285/16 (2006.01); C07F 7/22 (2006.01); C07F 9/92 (2006.01); C07F 9/94 (2006.01); G03F 7/26 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/06 (2013.01); C07C 309/19 (2013.01); C07C 309/30 (2013.01); C07C 309/39 (2013.01); C07C 311/48 (2013.01); C07D 285/16 (2013.01); C07F 7/2208 (2013.01); C07F 9/92 (2013.01); C07F 9/94 (2013.01); G03F 7/26 (2013.01); C07C 381/12 (2013.01); C07C 2602/42 (2017.05); G03F 7/2004 (2013.01);
Abstract

The present invention relates to a novel photoacid generator compound cation, comprising an element having for 92 eV photons (extreme ultraviolet (EUV)) an absorption cross section of at least 0.5×10·cm/mol; having at least two stable oxidation states; and selected from the elements of group 1 to group 15 of the periodic table of the elements. Additionally, the present invention relates to a photoacid generator comprising said photoacid generator compound cation and an anion. Furthermore, the present invention aims to provide a photoresist composition comprising said photoacid generator and an acid labile polymer. Finally, the present invention relates to a method of generating an acid using the photoresist composition and a method of forming a patterned materials feature on a substrate.

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