The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2025

Filed:

Feb. 13, 2020
Applicant:

Hitachi-lg Data Storage, Inc., Tokyo, JP;

Inventor:

Hiroyuki Minemura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G02B 6/0016 (2013.01); G02B 5/1861 (2013.01); G02B 6/0038 (2013.01); G02B 6/0065 (2013.01); G02B 2005/1804 (2013.01);
Abstract

The light-guide plate includes a substrate, an incidence diffraction grating that diffracts incident light, and an emission diffraction grating that emits light from the substrate, the light being diffracted by the incidence diffraction grating. The emission diffraction grating is formed of a recessed/projected pattern formed on a substrate surface, the recessed/projected pattern includes a first group of parallel straight lines and a second group of parallel straight lines intersecting the first group of parallel straight lines, and a pitch of the first group of parallel straight lines is equal to a pitch of the second group of parallel straight lines. A relationship between the pitch P of the first group of parallel straight lines and the second group of parallel straight lines and a pattern width W of the recessed/projected pattern is defined as W/P, which is 0.15 or more and 0.85 or less.


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