The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2025
Filed:
Oct. 11, 2022
Samsung Electronics Co., Ltd., Suwon-si, KR;
Ernest Rehmatulla Post, San Francisco, CA (US);
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
In one embodiment, a method of constructing a corrective phase mask for an optical element, includes propagating, for each of one or more wavelengths, a point source field from an object plane to a corrective mask plane to determine a source field and propagating, for each of the one or more wavelengths, the point source field from an image plane to the corrective mask plane to determine an image field. The method may further include determining, for each of the one or more wavelengths, a phase modulation field based on the source field and the image field; and determining a multi-wavelength phase modulation field based on combining the phase modulation field for each of the one or more wavelengths.