The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2025
Filed:
Nov. 05, 2020
Material for forming organic film, method for forming organic film, patterning process, and compound
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Daisuke Kori, Joetsu, JP;
Takayoshi Nakahara, Joetsu, JP;
Yusuke Biyajima, Joetsu, JP;
Kazumi Noda, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 33/16 (2006.01); C08L 33/06 (2006.01); C09D 171/12 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
C08L 33/16 (2013.01); C08L 33/066 (2013.01); C09D 171/12 (2013.01); G03F 7/0755 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); H01L 21/0274 (2013.01);
Abstract
A material for forming an organic film containing a compound of general formula (1) in which X is an organic group having a valency of n1 and 2 to 50 carbon atoms, n1 is an integer of 2 to 10, Ris at least one of formulae (2) to (4), where l1 is 0 or 1, and l2 is 0 or 1, and an organic solvent; an organic film material for forming an organic film that has all of high filling property, high planarizing property, and excellent adhesive force to a substrate.