The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2025
Filed:
Dec. 10, 2019
Interdigital Ce Patent Holdings, Sas, Paris, FR;
Oksana Shramkova, Liffré, FR;
Laurent Blonde, Thorigné-Fouillard, FR;
Valter Drazic, Betton, FR;
Mitra Damghanian, Cesson-Sévigné, FR;
INTERDIGITAL CE PATENT HOLDINGS, SAS, Paris, FR;
Abstract
A device configured for radiating a focused electromagnetic beam is proposed. Such device comprises: —a first () and a second () part having respectively a second nand third nrefractive index and a first Wand second W; —a first contact area () intended to be between a host medium having a first refractive index nand in which the micro or nanoparticles are intended to be trapped or moved by a focused electromagnetic beam radiated by the device; —a second contact area () between the first part and the second part; and —a third contact area () intended to be between the second part and the host medium. The focused electromagnetic beam results from a combination of at least two beams among a first (NJ), a second (NJ) and a third (NJ) jet beams radiated respectively by the first, second and third contact areas when an incoming electromagnetic wave (IEM) illuminates the device. The device is configured for having a direction of propagation of the focused electromagnetic beam tilted in respect of a direction of propagation of the incoming electromagnetic wave.