The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2025

Filed:

Apr. 23, 2020
Applicant:

Biosense Webster (Israel) Ltd., Yokneam, IL;

Inventors:

Keshava Datta, Chino Hills, CA (US);

Kristine Fuimaono, Costa Mesa, CA (US);

Assaf Govari, Haifa, IL;

Andres Claudio Altmann, Haifa, IL;

Tushar Sharma, Arcadia, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 18/00 (2006.01); A61B 18/14 (2006.01);
U.S. Cl.
CPC ...
A61B 18/1492 (2013.01); A61B 2018/00577 (2013.01); A61B 2018/00738 (2013.01); A61B 2018/00761 (2013.01); A61B 2018/00791 (2013.01);
Abstract

A method, including performing an ablation of tissue using a first high RF power for a short duration, suspending RF power for a predetermined period, and using a second high RF power for a short duration forming lesions with greater surface area and greater depth through resistive heating and thermal latency. High RF power may range between 75-95 W and short duration may range between 4-5 seconds.


Find Patent Forward Citations

Datta, Keshava. (2025). Temperature controlled short duration ablation with resistive heating (U.S. Patent No. 12213728). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12213728

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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