The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2025
Filed:
Dec. 07, 2023
Enig Associates, Inc., Rockville, MD (US);
Yil-Bong Kim, Silver Spring, MD (US);
Eric N. Enig, Bethesda, MD (US);
ENIG ASSOCIATES, INC., Rockville, MD (US);
Abstract
A pulsed ion current antenna includes an enclosed racetrack having an interior configured to be placed under vacuum. The enclosed racetrack has an ion injection zone, a beam merging zone, a first beam bending zone, a beam return zone, and a second beam bending zone. An ion source is provided at an end of the ion injection zone. Two parallel magnet plates are provided in each of the first and second beam bending zones, configured to produce a respective magnetic field that bends a path of travel of an ion beam within the enclosed racetrack. A plurality of loop coils are configured to generate magnetic fields to shape travel of ions within the enclosed racetrack such that ions from the ion source that are injected through the ion injection zone are merged in the beam merging zone into an ion beam within the enclosed racetrack.