The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2025

Filed:

Oct. 22, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Sarah Michelle Bobek, Sunnyvale, CA (US);

Venkata Sharat Chandra Parimi, Sunnyvale, CA (US);

Sungwon Ha, Palo Alto, CA (US);

Kwangduk Douglas Lee, Redwood City, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/505 (2006.01); H01L 21/02 (2006.01); H01L 21/033 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32834 (2013.01); C23C 16/4412 (2013.01); C23C 16/45521 (2013.01); C23C 16/505 (2013.01); H01J 37/32715 (2013.01); H01L 21/02115 (2013.01); H01L 21/02274 (2013.01); H01L 21/0332 (2013.01); H01L 21/67017 (2013.01); H01L 21/6719 (2013.01); H01J 2237/3321 (2013.01);
Abstract

Exemplary semiconductor processing systems may include a chamber body including sidewalls and a base. The system may include a substrate support extending through the base of the chamber body. The chamber body may define an access circumferentially extending about the substrate support at the base of the chamber body. The system may include one or more isolators disposed within the chamber body. The one or more isolators may define an exhaust path between the one or more isolators and the chamber body. The exhaust path may extend to the base of the chamber body. The systems may include a fluid source fluidly coupled with the chamber body at the access extending about the substrate support.


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