The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2025
Filed:
Dec. 01, 2022
Behavr, Llc, Elizabethtown, KY (US);
Frontact Co., Ltd., Tokyo, JP;
Aprilia Thompson, Elizabethtown, KY (US);
Brandon Hedges, Elizabethtown, KY (US);
Christina Zaluski, Marlborough, MA (US);
Eleanor Anderson, Elizabethtown, KY (US);
Georgia Mitsi, Marlborough, MA (US);
Joyce Tsai, Marlborough, MA (US);
Morgan Taylor, Elizabethtown, KY (US);
Risa Weisberg Hawkins, Elizabethtown, KY (US);
Sarah Zadd, Elizabethtown, KY (US);
Todd Grinnell, Marlborough, MA (US);
BehaVR, LLC, Elizabethtown, KY (US);
FrontAct Co., Ltd., Tokyo, JP;
Abstract
Systems and methods for implementing an exposure progression that improves an ability of a subject to manage a psychiatric or mental condition of the subject are provided. An exposure progression includes a plurality of categories in a hierarchical order. Each category is associated with one or more experiences, and each experience is associated with a digital reality scene that manifests a challenge. In some embodiments, the hierarchical order is generated or modified dynamically based at least in part on the level of success that a subject has had in one or more challenges, producing an exposure progression that it not only tailored to each subject but also with personalized timing and/or nature of the exposure practice.