The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2025
Filed:
Dec. 02, 2022
Unity Technologies Sf, San Francisco, CA (US);
Karan Singh, Toronto, CA;
Unity Technologies SF, San Francisco, CA (US);
Abstract
Disclosed is a method to determine influence of a deformation of a curve on a surface. A processor obtains deformations of the curve and desired deformations of the surface. The processor obtains a first point on the surface and determines the influence of the deformation of the curve on the surface by determining a second point on the curve and iterating over a desired deformation of the surface and a corresponding curve. To iterate, the processor determines a desired position of the first point of the desired deformation, determines a position of the first point based on a position of the second point on the corresponding curve and a parameter indicating the influence, and calculates a difference between the desired position of the first point and the determined position of the first point. Based on the difference, the processor adjusts the parameter, and determines the influence based on the parameter.