The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2025
Filed:
Dec. 22, 2022
Tpk Advanced Solutions Inc., Fujian, CN;
Xiang Mei Chen, Xiamen, CN;
Tai-Shih Cheng, Taipei, TW;
Lien-Hsin Lee, Taipei, TW;
Liang Liu, Yong'an, CN;
TPK Advanced Solutions Inc., Fujian, CN;
Abstract
A touch module includes first and second mesh electrode layers respectively with first and second irregular mesh patterns. Line segments of the first irregular mesh pattern are configured to form a first radial pattern having a first intersection point by translation. A top X % fan-blade shape area of line segment density in the first radial pattern is defined as a first dense area, in which X is at least 10. Line segments of the second irregular mesh pattern are configured to form a second radial pattern having a second intersection point by translation. A top X % fan-blade shape area of line segment density in the second radial pattern is defined as a second dense area. When the first radial pattern and the second radial pattern are translated so that the first and second intersection points coincide, the first dense area and the second dense area do not overlap.