The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2025
Filed:
Nov. 05, 2019
Applicant:
Universitaet Bayreuth, Bayreuth, DE;
Inventor:
Georg Herink, Bayreuth, DE;
Assignee:
UNIVERSITAET BAYREUTH, , DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/02001 (2022.01); B23K 26/03 (2006.01); B23K 26/0622 (2014.01); G01B 9/02 (2022.01);
U.S. Cl.
CPC ...
G01B 9/02014 (2013.01); B23K 26/032 (2013.01); B23K 26/0624 (2015.10); G01B 9/02084 (2013.01);
Abstract
Disclosed is a method and a device for in situ process monitoring and control down to a single pulse measurement during laser processing, like ablation, laser printing additive manufacturing and modification of refractive index. The disclosure relates to laser material processing and to an integrated process monitoring using interference effects of a laser beam or laser pulse.