The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2025

Filed:

Sep. 28, 2021
Applicant:

Industrial Technology Research Institute, Hsinchu, TW;

Inventors:

Guan-You Lin, Hsinchu County, TW;

Yi-Fong Pan, Kaohsiung, TW;

Sin-Yi Huang, Miaoli County, TW;

Hsin-Ju Yang, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/461 (2023.01); C02F 1/00 (2023.01); C02F 1/469 (2023.01);
U.S. Cl.
CPC ...
C02F 1/46109 (2013.01); C02F 1/008 (2013.01); C02F 2001/46119 (2013.01); C02F 1/4693 (2013.01); C02F 2201/46115 (2013.01); C02F 2201/46135 (2013.01); C02F 2201/4614 (2013.01); C02F 2209/03 (2013.01);
Abstract

Provided are a system for treating wastewater and a cleaning method thereof. The wastewater treatment system includes: a wastewater compartment, a first electrode, a second electrode, an acid compartment, a base compartment, an acid supply apparatus, a base supply apparatus, a control apparatus, and a power supply device. During the cleaning process, the power supply device provides reverse potential to the first and the second electrodes. The control apparatus shut off a first channel so that the acid supply apparatus provides an acid solution to the base compartment through a second channel, and shut off a third channel so that the base supply apparatus provides an alkaline solution to the acid compartment through a fourth channel, without shutting off the wastewater treatment system.


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