The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2025

Filed:

Aug. 01, 2022
Applicant:

Largan Precision Co., Ltd., Taichung, TW;

Inventor:

Wei-Che Tung, Taichung, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 23/55 (2023.01); G02B 13/00 (2006.01); G06F 1/16 (2006.01);
U.S. Cl.
CPC ...
H04N 23/55 (2023.01); G02B 13/0015 (2013.01); G02B 13/0055 (2013.01); G02B 2207/101 (2013.01); G06F 1/1686 (2013.01);
Abstract

An imaging lens includes a light blocking sheet that includes an inner ring surface, a plurality of tapered light blocking structures, and a nanostructure layer. The inner ring surface surrounds an optical axis and defines a light passage opening. The tapered light blocking structures are disposed on the inner ring surface, and each tapered light blocking structure protrudes from the inner ring surface and tapers off towards the optical axis. The tapered light blocking structures are periodically arranged to surround the optical axis. The contour of each tapered light blocking structure has a curved part in a view along the optical axis. The curved part forms a curved surface on the inner ring surface. The nanostructure layer is disposed on the curved surface and has a plurality of ridge-like protrusions that extend non-directionally, and the average structure height of the nanostructure layer ranges from 98 nanometers to 350 nanometers.


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