The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2025
Filed:
Sep. 10, 2021
Kioxia Corporation, Tokyo, JP;
Kazuhiro Takahata, Yokohama Kanagawa, JP;
Kioxia Corporation, Tokyo, JP;
Abstract
A design pattern generation method of an embodiment is a method for generating a design pattern of a template. The design pattern generation method includes: generating an actual pattern including a first pattern protruding from a contact surface of the template with a material layer and extending in a predetermined direction along the contact surface, and a second pattern further protruding from an upper surface of the first pattern; calculating a volume of the first pattern and the second pattern per unit area on the contact surface; and adding, when a difference in the volume of the first pattern and the second pattern per unit area between regions on the contact surface exceeds a specified value, a third pattern to a region where the volume of the first pattern and the second pattern per unit area is small.