The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2025

Filed:

Jul. 27, 2022
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Tatsuya Arakawa, Kanagawa, JP;

Kenichi Kobayashi, Tochigi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01);
Abstract

The imprint apparatus according to the present invention for forming a pattern by curing a resin in a state in which a pattern region in a mold is brought into contact with the resin on a shot region in a substrate, includes an element configured to adjust an irradiation region of light from a light source with which the substrate is irradiated, a measurement unit configured to measure a position of a mark formed in the mold, and a controller configured to control a position of the irradiation region with respect to the position of the mark in a plane parallel to a surface of the substrate, based on a measurement result of the position of the mark by the measurement unit.


Find Patent Forward Citations

Loading…