The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2025
Filed:
Sep. 21, 2020
Canon Kabushiki Kaisha, Tokyo, JP;
Masato Ito, Utsunomiya, JP;
Yoshinari Someya, Shioya-gun, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
In order to provide a method for shortening acquisition of illumination conditions, an imprint method for forming a pattern on an imprint material R supplied onto a substrate W using a mold includes: performing a first illumination process of illuminating a mold mark Mmark formed on the mold M and a substrate mark Wmark formed in each of a plurality of first shot regions on the substrate W and adjusting each of illumination conditions in a state in which the mold M and the imprint material R supplied to each of the plurality of first shot regions are brought into contact with each other; and performing a deriving process of deriving approximate illumination conditions indicating illumination conditions for a second shot region that is different from the plurality of first shot regions, on the basis of each of the illumination conditions for the plurality of first shot regions adjusted in the first illumination process.