The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2025

Filed:

Jan. 27, 2022
Applicants:

Research Foundation of the City University of New York, New York, NY (US);

Nanohmics Inc., Austin, TX (US);

Inventors:

Andrea Alù, Tenafly, NJ (US);

Adam C. Overvig, Bronx, NY (US);

Shuwei Guo, New York, NY (US);

You Zhou, Jersey City, NJ (US);

Mark Lucente, Austin, TX (US);

Assignees:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/00 (2006.01); G02B 27/10 (2006.01);
U.S. Cl.
CPC ...
G02B 1/002 (2013.01); G02B 27/1006 (2013.01);
Abstract

A metasurface that is designed to control electromagnetic radiation (EMR) in ways that perform more than a single function. The metasurface has a substrate layer that has multiple asymmetric nanofeatures, each having a height (H) between λ/100 and 2λ. Each nanofeature has a particular length (D) that extends along a principal in-plane direction θ and a width (D) that is orthogonal thereto. Each nanofeature is tailored to scatter with different patterns one polarization state of electromagnetic radiation and one orthogonal polarization state of electromagnetic radiation.


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