The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2025

Filed:

Oct. 10, 2019
Applicant:

Ramot AT Tel-aviv University Ltd., Tel Aviv, IL;

Inventors:

David Eliyahu, Tel Aviv, IL;

Noam Eliaz, Tel Aviv, IL;

Eliezer Gileadi, Tel Aviv, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/165 (2017.01); B22F 10/10 (2021.01); B22F 10/32 (2021.01); B22F 10/85 (2021.01); B22F 12/90 (2021.01); B29C 64/106 (2017.01); B29C 64/393 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/02 (2015.01); C25D 1/00 (2006.01); C25D 5/04 (2006.01); C25D 21/12 (2006.01);
U.S. Cl.
CPC ...
B29C 64/165 (2017.08); B22F 10/10 (2021.01); B22F 10/32 (2021.01); B22F 10/85 (2021.01); B22F 12/90 (2021.01); B29C 64/106 (2017.08); B29C 64/393 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12); C25D 1/003 (2013.01); C25D 5/04 (2013.01); C25D 21/12 (2013.01);
Abstract

The invention relates to a process and a system for 3-dimentional (3D) fabrication of sub-micron structures and is established by local electrochemical deposition methods.


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