The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Apr. 14, 2020
Applicant:
Persimmon Technologies Corporation, Wakefield, MA (US);
Inventors:
Martin Hosek, Lowell, MA (US);
Jayaraman Krishnasamy, Boxborough, MA (US);
Assignee:
Persimmon Technologies Corporation, Wakefield, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 4/08 (2016.01); B22F 1/16 (2022.01); H01F 1/33 (2006.01); H01F 41/02 (2006.01); H02K 1/02 (2006.01); H02K 1/14 (2006.01); H02K 15/02 (2006.01); B22F 1/068 (2022.01); B22F 3/115 (2006.01); B22F 5/10 (2006.01);
U.S. Cl.
CPC ...
H02K 1/02 (2013.01); H01F 1/33 (2013.01); H01F 41/0206 (2013.01); H02K 1/146 (2013.01); H02K 15/022 (2013.01); B22F 1/068 (2022.01); B22F 1/16 (2022.01); B22F 3/115 (2013.01); B22F 5/106 (2013.01); B22F 2998/10 (2013.01); B22F 2999/00 (2013.01); C22C 2202/02 (2013.01);
Abstract
A material comprises at least one layer of a plurality of domains, each domain being flattened in a first direction and elongated in a second direction normal to the first direction. The flattened and elongated domains define an anisotropic microstructure that facilitates a magnetic flux flow in the second direction.