The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

Dec. 23, 2020
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Junhee Youn, Chungcheongnam-do, KR;

Seung Hwan Cho, Ulsan, KR;

Assignee:

SEMES CO. LTD., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/08 (2006.01); C02F 1/58 (2023.01); C02F 1/72 (2023.01); C02F 1/78 (2023.01); B08B 3/14 (2006.01); C02F 1/34 (2023.01); C02F 101/10 (2006.01); C02F 103/34 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67017 (2013.01); B08B 3/08 (2013.01); C02F 1/58 (2013.01); C02F 1/727 (2013.01); C02F 1/78 (2013.01); B08B 3/14 (2013.01); C02F 1/34 (2013.01); C02F 2101/10 (2013.01); C02F 2103/346 (2013.01); C02F 2301/024 (2013.01); C02F 2301/046 (2013.01); C02F 2303/18 (2013.01); H01L 21/67051 (2013.01);
Abstract

Disclosed are a substrate processing apparatus and a process fluid treating apparatus. The substrate processing apparatus includes a process chamber that processes a substrate with a process fluid including ozone, a discharge conduit connected to the process chamber to discharge the process fluid used to process the substrate, and a process fluid treating apparatus connected with the discharge conduit. The process fluid treating apparatus includes a housing having an inner space with a set volume in which the process fluid is received and an injection nozzle connecting the discharge conduit and the inner space of the housing.


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