The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

Dec. 17, 2021
Applicant:

Vapor Technologies, Inc., Longmont, CO (US);

Inventor:

Zachary Zembower, Northglenn, CO (US);

Assignee:

Vapor Technologies, Inc., Longmont, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/32 (2006.01); C23C 14/54 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32669 (2013.01); C23C 14/325 (2013.01); C23C 14/54 (2013.01); H01J 37/32064 (2013.01); H01J 37/32568 (2013.01); H01J 37/32614 (2013.01);
Abstract

An arc deposition system includes a coating chamber and a central cathode target disposed within the coating chamber. At least two anodes surround the central cathode target. Each anode is positively biased with respect to the central cathode target such that each anode independently induces an associated racetrack erosion profile on the central cathode target. At least two magnetic components are located within the central cathode target. The magnetic components guide an associated arc that forms its associated racetrack erosion profile. Characteristically, each anode of the at least two anodes has an associated magnetic component.


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