The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

Apr. 15, 2021
Applicant:

Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;

Inventors:

Shuang Sun, Shenzhen, CN;

Chen Li, Shenzhen, CN;

Yuwing Tai, Shenzhen, CN;

Jiaya Jia, Shenzhen, CN;

Xiaoyong Shen, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/73 (2017.01); G06F 18/22 (2023.01); G06N 3/08 (2023.01); G06T 7/70 (2017.01); G06T 17/00 (2006.01); G06V 10/80 (2022.01); G06V 10/82 (2022.01); G06V 40/10 (2022.01);
U.S. Cl.
CPC ...
G06T 7/74 (2017.01); G06F 18/22 (2023.01); G06N 3/08 (2013.01); G06T 7/70 (2017.01); G06T 17/00 (2013.01); G06V 10/809 (2022.01); G06V 10/82 (2022.01); G06V 40/11 (2022.01); G06T 2207/20044 (2013.01);
Abstract

A method for training an SMPL parameter prediction model, including: obtaining a sample picture; inputting the sample picture into a pose parameter prediction model to obtain a predicted pose parameter; inputting the sample picture into a shape parameter prediction model to obtain a predicted shape parameter; calculating model prediction losses according to an SMPL parameter prediction model and annotation information of the sample picture; and updating the pose parameter prediction model and the shape parameter prediction model according to the model prediction losses.


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