The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

May. 16, 2021
Applicant:

Nec Laboratories America, Inc., Princeton, NJ (US);

Inventors:

Yue Tian, Princeton, NJ (US);

Ting Wang, West Windsor, NJ (US);

Shengtao Sun, Glassboro, NJ (US);

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 40/16 (2022.01); G02B 26/08 (2006.01); G02B 27/09 (2006.01); G06N 3/04 (2023.01); G06T 7/521 (2017.01);
U.S. Cl.
CPC ...
G06T 7/521 (2017.01); G02B 26/0833 (2013.01); G02B 27/0927 (2013.01); G06N 3/04 (2013.01); G06V 40/166 (2022.01); G06T 2207/10048 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30201 (2013.01);
Abstract

Aspects of the present disclosure describe systems, methods, and structures for anti-spoofing 3D face reconstruction using infrared structured light that advantageously reconstructs 3D face structures for facial recognition and detect face surface material(s) such that human skin may be effectively distinguished from artifacts thereby providing additional security for facial recognition including immunity from 2D/3D print attacks including face masks and special make-ups.


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