The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Jun. 26, 2023
Adobe Inc., San Jose, CA (US);
Milos Hasan, Oakland, CA (US);
Liang Shi, Cambridge, MA (US);
Tamy Boubekeur, Paris, FR;
Kalyan Sunkavalli, San Jose, CA (US);
Radomir Mech, Mountain View, CA (US);
Adobe Inc., San Jose, CA (US);
Abstract
The present disclosure relates to using end-to-end differentiable pipeline for optimizing parameters of a base procedural material to generate a procedural material corresponding to a target physical material. For example, the disclosed systems can receive a digital image of a target physical material. In response, the disclosed systems can retrieve a differentiable procedural material for use as a base procedural material in response. The disclosed systems can compare a digital image of the base procedural material with the digital image of the target physical material using a loss function, such as a style loss function that compares visual appearance. Based on the determined loss, the disclosed systems can modify the parameters of the base procedural material to determine procedural material parameters for the target physical material. The disclosed systems can generate a procedural material corresponding to the base procedural material using the determined procedural material parameters.