The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Nov. 23, 2020
Lpe S.p.a., Baranzate, IT;
Silvio Preti, Baranzate, IT;
Maurilio Meschia, Baranzate, IT;
LPE S.P.A., Baranzate, IT;
Abstract
The device () is for supporting substrates in a reaction chamber of an epitaxial reactor; it comprises: a disc-shaped element () having a first face (A) adapted to be upperly positioned when the device () is being used and a second face (B) adapted to be lowerly positioned when the device () is being used, said disc-shaped element () being adapted to receive a gas flow (F) to rotate the device () about an axis (X) thereof, a substrate-supporting element () in a single piece with said disc-shaped element () and preferably adjacent to said first face (A), and a shaft () coaxial to said disc-shaped element (), in a single piece with said disc-shaped element () and having a first end (A) at said second face (B); said shaft () has at a second end (B) thereof at least a protrusion (A,B,C) whose rotation is adapted to be detected by a pyrometer () or a thermographic camera.